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通过倾斜旋转的圆形剥离阴影或镂空掩模进行蒸发

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发表于 2018-12-27 08:57:22 | 显示全部楼层 |阅读模式
On evaporation via an inclined rotating circular lift-off shadow or stencil mask
通过倾斜旋转的圆形剥离阴影或镂空掩模进行蒸发
Journal of Vacuum Science & Technology B 37, 011602 (2019);

https://doi.org/10.1116/1.5057404

Steve Arscotta)
Hide Affiliations
Institut d’Electronique, de Microélectronique et de Nanotechnologie (IEMN), CNRS UMR8520, University of Lille, Cité Scientifique, Avenue Poincaré, 59652 Villeneuve d’Ascq, France
a)Electronic mail: steve.arscott@iemn.univ-lille1.fr

ABSTRACT

A mathematical model is developed to calculate the topography of a mesa obtained by evaporation of matter via inclined rotating lift-off shadow masking. Two types of masking are considered: a circular mask and a cylindrical mask—the latter involves sidewall deposition. The model is able to predict various topographic profiles obtained via the evaporative deposition of matter, e.g., metals, when using a physical mask, e.g., a photoresist or an electron beam-sensitive resist patterned onto a flat wafer. The model predicts a range of profiles, e.g., sharp cones, round-tipped cones, spikes, irregular bumps, flat-topped features, “bagel-shaped” features, flat rings, and cylinders (fixed to the wafer and releasable)—depending on the aspect ratio of the circular opening, the deposition thickness, and the evaporation tilt angle. The ideas are extended to model an idealized resist-based lift-off mask involving overhang and undercut features. The model is simple to implement and should be of use for predicting the shape of deposited matter when using lift-off and stencil procedures—even at sub-micrometer dimensions. Despite its simplicity, the model goes some way in helping to understand the sensitivity of the various parameters on the final topography of the deposited matter. For example, the tilt angle—even when small—has an influence on the curvature radius of cone tips. In this way, the prediction—and even optimization—of the shape of the deposited material is possible prior to embarking on time-consuming, and perhaps costly, experimentation.



        本文开发了一种数学模型来计算一种由蒸发物质而得到的台面的形貌,蒸发是通过倾斜旋转剥离阴影掩模实施的。考虑了两种类型的掩模:圆形掩模和圆柱形掩模 - 后者涉及侧壁沉积。当使用物理掩模(例如,光致抗蚀剂或平坦晶片上图案化了的电子束敏感抗蚀剂)时,该模型能够预测通过蒸发沉积获得的物质(例如金属)的各种形貌分布。该模型预测了一系列分布的范围,例如尖锥、圆顶锥、尖峰、不规则凸起,平顶特征形、“百吉饼形”特征形,扁平环和圆柱体(固定在晶圆上并可释放) - 这取决于圆形开口的纵横比,沉积厚度和蒸发倾斜角。这些想法被扩展到模型化理想的基于抗蚀剂的剥离掩模,其包括悬垂和侧凹特征的掩模。该模型易于实施,并且在使用剥离和镂空工序时预测沉积物的形状 - 即使在亚微米尺寸下也能使用。尽管该模型很简单,但它在某种程度上有助于理解各种参数对沉积物质最终形貌的敏感性。例如,倾斜角 - 即使很小 - 对锥形尖端的曲率半径会有影响。这样,在投入耗时且昂贵的实验之前,就可以预测,甚至优化沉积材料的形状。

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