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反应等离子沉积装置的性能研究

反应等离子沉积装置的性能研究
杜荣池,王广才,张晓丹,张迎春,赵颖
1. 南开大学光电子薄膜器件与技术研究所;a. 光电子薄膜器件与技术天津市重点实验室;b. 光电信息技术科学教育部重点实验室;
2. 北京捷造光电技术有限公司
RESEARCH OF REACTIVE PLASMA DEPOSITION SYSTEM
DU Rong-chi,WANG Guang-cai,ZHANG Xiao-dan,ZHANG Ying-chun,ZHAO Ying
1a. Key Laboratory of Photo-electronics Thin Film Devices and Technique of Tianjin,b. Key Laboratory of Photo-Electronic Information Science and Technology of Ministry of Education,Nankai University,Institute of Photo-electronics Thin Film Devices and Technique;
2. Beijing Jiezao Photoelectric Technology Co.,Ltd.


摘要:反应等离子沉积方法具有离子轰击能量低、薄膜沉积时衬底温度低的特点,可应用于太阳电池、LED(OLED)等的高质量透明导电材料的制备,有利于获得高转换效率的太阳电池。对反应等离子沉积系统进行了研究,并在FLD08型RPD设备上,制备了掺钨透明氧化物IWO薄膜材料,获得了较好的结果。


关键词:反应等离子体,  透明导电膜,  掺钨透明氧化物    
Abstract:Reactive plasma deposition system has the characteristics of low ion bombardment energy and low substrate temperature when the film is deposited. It can be applied to the deposition of transparent conductive materials,and this technology is conducive to high conversion efficiency of solar cells. In this paper,the reaction plasma deposition system was studied with the RPD equipment of model FLD08. Tungsten doped indium oxide(IWO)thin films were deposited,and good results were obtained.


Key words: reactive plasma deposition    TCO film    IWO film


基金资助:国家高技术研究发展计划(2013AA050302)和天津市科技支撑计划项目(10ZCKFGX02200)资助的课题


作者简介: 杜荣池(1991-),男,山东聊城人,硕士研究生,研究方向为光伏能源器件


引用本文: 杜荣池,王广才,张晓丹,张迎春,赵颖. 反应等离子沉积装置的性能研究[J]. 真空与低温, 2017, 23(3): 136-.
DU Rong-chi,WANG Guang-cai,ZHANG Xiao-dan,ZHANG Ying-chun,ZHAO Ying. RESEARCH OF REACTIVE PLASMA DEPOSITION SYSTEM. journal1, 2017, 23(3): 136-.


文章来源:《真空与低温》杂志2017年23卷3期

刊出日期:2017-06-28

链接地址:http://www.lipcast.cn:81/zkydw/CN/abstract/abstract136.shtml