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用于150 mm晶片的场发射扫描探针刻蚀工具

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发表于 2018-11-1 08:59:31 | 显示全部楼层 |阅读模式
Field-emission scanning probe lithography tool for 150 mm wafer
用于150 mm晶片的场发射扫描探针刻蚀工具
Journal of Vacuum Science & Technology B 36, 06JL06 (2018);
https://doi.org/10.1116/1.5048357

Mathias Holz1,a), Elshad Guliyev2,b), Ahmad Ahmad1,2,c), Tzvetan Ivanov2,d), Alexander Reum1,2,e), Martin Hofmann2,f), Claudia Lenk2,g), Marcus Kaestner2,h), Christoph Reuter1,2,i),Steve Lenk2,j), Ivo W. Rangelow2,k), and Nikolay Nikolov3,l)
Hide Affiliations
1nano analytik GmbH, Ehrenbergstraße 1, 98693 Ilmenau, Germany
2Department of Micro- and Nanoelectronic Systems, Institute of Micro and Nanoelectronics, Ilmenau University of Technology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany
3Mikrosistemi LTD, Studentska 1a Str. Office 8, 9010 Varna, Bulgaria
a)Electronic mail: m.holz@nanoanalytik.net
b)Electronic mail: elshad.guliyev@tu-ilmenau.de
c)Electronic mail: ahmad.ahmad@tu-ilmenau.de
d)Electronic mail: tzvetan.ivanov@tu-ilmenau.de
e)Electronic mail: alexander.reum@tu-ilmenau.de
f)Electronic mail: hofmann.martin@tu-ilmenau.de
g)Electronic mail: claudia.lenk@tu-ilmenau.de
h)Electronic mail: kaestner.marcus@gmail.com
i)Electronic mail: christoph.reuter@tu-ilmenau.de
j)Electronic mail: steve.lenk@tu-ilmenau.de
k)Electronic mail: ivo.rangelow@tu-ilmenau.de
l)Electronic mail: n.nikolov@mikrosistemi.com

ABSTRACT
摘要

The development of next nodes of nano-electronic devices requires mask-less techniques for fast prototyping and analysis of ultimately down-scaled devices or for fabrication of templates for nanoimprint based high-volume manufacturing. Moreover, the atomic force microscopy (AFM) of large surfaces with acceptable speed becomes an issue with the introduction of large-sized wafers. The authors have designed an AFM system which is capable of field-emission scanning probe lithography on 150 mm wafers providing superior accuracy better than 3 nm. The system is also providing noncontact, high-resolution 3D imaging employing active probes (i.e., piezoresistive self-sensing and thermo-mechanically self-actuated probes) and capable to operate with an array of four cantilevers. A high-precision X-Y-θ stage with 10 nm positioning accuracy and with 360° rotation capability enables the highest placement precision and cost effective large scanning field imaging.



        纳米电子器件的下一个节点的开发需要无掩模技术,以便用于最终缩小的器件的快速原型制作和分析,或者用于生产基于纳米压印的大批量制作的模板。此外,具有可接受速度的大表面的原子力显微镜(AFM)成为引入大尺寸晶片的一个课题。作者设计了一种AFM系统,它能够在150 mm晶片上进行场-发射扫描探针刻蚀,提供优于3 nm的优异拼接精度。该系统还提供采用有源探针的非接触式高分辨率3D成像(即压阻式自感应和热机械自驱动探针),并且能够使用四个悬臂阵列进行操作。一个高精度X-Y-θ平台具有10 nm定位精度和360°旋转功能,可实现最高的置位精度和经济高效的大扫描场成像。

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